ABNER E1-M High-Resolution 2D Material Metallurgical Micro Transfer System

The ABNER E1-M High-Resolution 2D Material Metallurgical Micro Transfer System is a precision instrument targeting cutting-edge material research. It is specially engineered for non-destructive transfer, precise positioning and in-situ characterization of two-dimensional materials. Integrated with high-resolution microscopic observation, automatic transfer control and environment-adapted modules, it delivers a full-process lab solution covering sample preparation to performance analysis, facilitating application research of graphene, boron nitride and other 2D materials in electronics and optoelectronics.

It delivers ultra-clear imaging with eyepiece observation, and can be integrated with Raman and photoluminescence spectroscopy for synchronous testing during material transfer. Motorized precision displacement and control modules are available as optional upgrades.

The E1-M is suitable for precise point-to-point transfer of monolayer materials such as graphene, molybdenum disulfide and black phosphorus, as well as fabrication of multilayer van der Waals heterostructures, enabling visual operation throughout low-dimensional material transfer. The transfer system consists of a microscopic unit, three-axis transfer stage, vacuum adsorption heating integrated sample chuck and other assemblies. The target substrate stage supports large-angle in-plane rotation, making it a powerful tool for investigating heterostructure properties, spatial inversion symmetry breaking and the effects of different stacking configurations of 2D materials. Its highly stable, high-precision mechanical design and premium microscopic imaging system allow accurate transfer of tiny samples smaller than 5 μm.

While inheriting the excellent integrated transfer operation of the E1-T model, the E1-M features an upgraded Nikon metallurgical microscope optical system that drastically boosts resolution and clarity for observing monolayers, multilayers and various van der Waals heterostructures. It unifies all device fabrication workflows including observation, transfer and image recording. The E1-M offers abundant optional configurations, including high-temperature sample stage modules, Raman test modules and photoluminescence test modules. It comes with a damped optical vibration isolation platform and supports installation for operation inside glove boxes.

Main Configuration

II. Equipment Parameters

Microscopy System: Optical microscope with resolution ≤0.5 μm and continuously adjustable magnification from 50× to 1000×; equipped with a CCD camera to support 4K image acquisition.

Transfer Stage: Fully automatic six-axis displacement stage with positioning accuracy of ±1 μm and travel range of 100 mm × 100 mm × 50 mm.

Environmental Control: Working chamber vacuum level ≤1×10⁻³ Pa; supports sample heating from room temperature up to 150 °C.

Control System: Industrial touch control host pre-installed with dedicated control software, enabling one-click preset transfer procedures.

III. Functional Features

Damage-Free Transfer: Combines electrostatic adsorption and mechanical exfoliation to maximally preserve the integrity of 2D materials.

In-situ Observation: Real-time monitoring of material position and status during transfer for precise transfer accuracy control.

Multi-Sample Compatibility: Compatible with various sample carriers including wafers and flexible substrates.

Automated Workflow: Multiple pre-set transfer process packages available to complete complex transfer operations with one click.

IV. Application Scenarios & Fields

2D Material Research: Fabrication of heterostructures such as graphene and transition metal dichalcogenides (TMDs).

Semiconductor Devices: Prototyping of 2D material-based transistors and sensors.

Flexible Electronics: Precision transfer and integration of 2D materials on flexible substrates.

Optical Devices: Fabrication and performance characterization of 2D material optical thin films.

V. Technical Advantages

High-Precision Positioning: Six-axis displacement stage paired with a vision guidance system delivers sub-micron transfer accuracy.

Low-Damage Design: Non-contact transfer process prevents wrinkling and damage of materials.

Wide Compatibility: Supports various combinations of 2D materials and substrates to meet diverse research requirements.

User-Friendly Operation: Visualized operation interface lowers operation barriers and shortens experimental cycles.

VI. Typical Application Cases

University Laboratories: A top-tier university utilized this system to successfully fabricate tri-layer graphene-boron nitride heterostructures and develop high-mobility transistors operating at room temperature; relevant research findings were published in Nature Nanotechnology.

Corporate R&D Centers: A semiconductor enterprise adopted this system to realize batch transfer of 2D materials on flexible sensors, advancing related products to mass production.

Equipment Appearance Diagram

The E1-M system consists of four subsystems: the substrate stage adjustment subsystem, the slide moving platform adjustment subsystem, the microscopic imaging subsystem, and the circuit control subsystem.

The sample stage features five-axis adjustability: it supports translation along the XY axes with a travel range of 20 mm and a system resolution of 0.002 mm; manual rotational adjustment around the Z axis with a maximum range of ±90°; a tilt stage for rotation around the X and Y axes with a tilt angle of ±2°; and a Z-axis travel range of 10 mm with an accuracy of 2 μm.

The glass slide holder offers three-axis XYZ adjustability with a travel range of 25 mm. Samples are loaded onto a manual rotary stage that provides a coarse rotation range of 360° and a fine rotation range of ±5°, with a positioning accuracy of 1 to 2°. The tilt angle of the glass slide along the Y axis is adjustable within a range of ±15° at an adjustment accuracy of approximately 0.1°, operated via a manual micrometer head.

The microscopic imaging system adopts a Nikon metallurgical microscope observation system equipped with a trinocular tube, four objective lenses (5×, 10×, 20×, 50×) and two 10× eyepieces. It is fitted with a 12-megapixel USB3.0 ultra-high-definition CMOS microscopic camera, accompanied by dedicated camera control software that supports functions including photo capture, video recording, sample dimension measurement, and split-screen comparison.

The motorized Z axis is equipped with imported motors and controllers, delivering a travel range of 25 mm and a minimum travel precision of 0.1 μm. Multiple speed levels are selectable, with both continuous stepping and single-step motion modes available. It is suitable for applications such as slow heterojunction lamination and automatic lamination inside glove boxes. Precise control of the Z-axis movement speed reduces interlayer bubbles generated during heterojunction transfer and lamination, and enables fine Z-axis manipulation within glove boxes.

Electric rotation unit adopts imported motor and controller, with a rotatable range of ±90° and angular precision up to 0.01°. It supports both continuous rotation and single-step rotation functions. It is especially suitable for fabricating twisted bilayer graphene via stacking, as well as various twisted and misaligned heterostructure 2D devices that require precise control of stacking orientation.

METATEST electric control software enables convenient speed configuration and motion control of the electric stage. Meanwhile, it supports image rotation and transparency adjustment, greatly facilitating sample positioning and precise transfer.

Equipment Imaging View

Bright & Dark Field UpgradeComprehensive upgrade of the epi-illuminator and objective lenses allows high-resolution and high-sensitivity detection of specimen distinctions and defects.

It can be visually observed from the images: a dark-field image is obtained by completely inverting the contrast under bright-field illumination, where bright areas in bright-field imaging turn dark and dark areas become bright. For samples such as nanowires, nanosheets, or specimens with defects, uneven or rough surfaces, dark-field imaging enables clear visualization of the sample outlines as well as surface defects.

The setting shown in the figure: Heat up to 80°C at 0.5°C/s and hold for 200 s, then heat up to 120°C and hold for 200 s, then heat up to 150°C and hold for 200 s, then stop.

High-precision software-controlled thermal stage with adjustable heating rates and slow cooling rates, delivering unique experimental operating conditions! Its maximum heating temperature reaches 240°C; the controllable heating rate ranges from a minimum of 0.01°C/s to a maximum of 1°C/s (for temperatures below 100°C), and the heating rate is no less than 0.2°C/s at high temperatures. Equipped with upper computer software that supports software connection and segmented temperature control, it enables heating rate adjustment via computer and displays temperature curves on the user interface!

Supporting damped optical vibration isolation platform to reduce environmental disturbances during high-magnification operations (multiple specifications available including 900*600*50mm tabletop and 600*600*50mm tabletop, etc.)

☆☆☆E1-M can be integrated with Raman and fluorescence spectrum testing functions to realize testing while sample transferring. Customization for such requirements is available upon inquiry.