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艾博纳微纳米科技(江苏)有限责任公司

Eall:service@abner-nano.com

Contact Number: 13327968688  Mr. Yan

English Translation

Company Address:Huai'an (Headquarters): No. 7 Meigao Road, Qingpu Industrial Park, Qingjiangpu District, Huai'an City, Jiangsu ProvinceSuzhou: 4th Floor, Building D, China-Netherlands Innovation Hub, No. 588 Xiangrong Road, Beihejing Sub-district, Xiangcheng District, Suzhou City, Jiangsu Province

Dongguan: Room 4216, 42nd Floor, Dongjiang Star Commercial Building, Dongguan City, Guangdong Province


150kV Micro-focus X-ray source UN-U150B

150kV Micro-focus X-ray source UN-U150B

  • Category:X-ray Imaging Equipment
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  • Release time:2026-02-05 13:27:49
  • Product description

The UN-U150 150 kV microfocus X-ray source, independently developed by Abner, is designed for high-resolution X-ray imaging, non-destructive testing of microstructures and research-grade material characterization applications. Adopting a highly stable electron optical design and microfocus target structure, this product delivers micron-level spatial resolution while maintaining strong penetration capability. It is suitable for high-end application scenarios including X-ray CT, micron/submicron defect inspection, semiconductor package inspection, and internal material structure analysis. The UN-U150 has undergone system-level optimization in structural reliability, thermal stability and long-term operational consistency. It can serve as the core radiation source module for desktop microfocus CT systems, in-line inspection systems and customized X-ray analysis platforms.


 I. Product Features and Advantages

1. 150 kV high-voltage platform, balancing resolution and penetration power

The maximum tube voltage reaches 150 kV, suitable for high-density materials and samples with complex structures. While maintaining a micro-focus size, it achieves excellent imaging contrast and signal-to-noise ratio, supporting multi-scenario applications ranging from low-Z materials to medium and high-Z alloys and packaging structures.


2. Micro-focus design enabling high-resolution imaging

It adopts a precision electron beam focusing system. The focal spot size can reach the micrometer scale (μm level). It significantly improves spatial resolution under geometric magnification and is suitable for micro-defect inspection.


3. Highly stable electron optical system

Integrated design of high-voltage module, filament power supply and beam current control system. It features low tube current fluctuation and good repeatability during long-term operation, ideal for long-duration continuous work scenarios such as CT scanning.


4. Efficient heat dissipation and optimized target structure

Coordinated design of target material and heat dissipation structure. It effectively reduces the impact of thermal drift on focal spot size and beam current stability, extending the service life and operational reliability of the X-ray source.


5. Modular interface for easy system integration

Supports multiple system integration methods (CT, inspection lines, experimental platforms). It can be deeply adapted to Aibona's self-developed X-ray imaging systems and precision motion platforms, and supports customized interfaces and control protocols.


II. Typical Application Fields


Micro-focus X-ray CT system; semiconductor packaging / chip solder joint / TSV inspection; non-destructive testing of precision electronic devices; internal defect analysis of metals and composite materials; research-grade material structure characterization; new energy battery and micro-structure device inspection


III. Technical Specifications


1. X-ray Tube Parameters




Maximum tube current

Parameter ItemTechnical Indicators
ModelUN-U150
Tube voltage range30 – 150 kV
≤ 500 μA(Typical value, depends on focus mode)
Maximum output power≤ 75 W(According to the working mode)
Focus Typemicrofocus
Minimum focal spot sizeMicron scale (μm order of magnitude, typically ≤ 5 μm)
target materialTungsten (W) or custom options available
target angleOptimized Design (Typical 10°–20°)



2. Imaging and Stability Indicators


Tube current stabilityFocus drift

Parameter ItemTechnical Indicators
Tube voltage stability≤ ±0.1%
≤ ±0.5%
≤μm (long-term stable operation)
Startup time< 5 min(Reach a stable working state)


3. Cooling and Structure


Parameter ItemTechnical Indicators
Cooling methodForced air cooling / Optional liquid cooling
Continuous working capabilitySupports long-term continuous operation
protective structureIntegrated X-ray shielding design
Safety interlockMultiple interlock protection (access control / temperature control / high voltage)


4. Electrical and Control Interface


Parameter ItemTechnical Indicators
High-voltage power supplyIntegrated design with built-in or external configuration
控制方式Local / Remote Control
通讯接口Ethernet / RS-232(Customizable)
软件支持Windows Platform supporting secondary development


5.Installation and Environment Requirements


Installation MethodMeet the standard

Parameter ItemTechnical Indicators
Operating ambient temperature10 – 30 °C
Relative humidity≤ 70%(No condensation)
System-integrated / Custom Bracket
GB / IEC X Standards Related to Radiation Safety


Detection effect diagram:


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Company's main business: scientific research instruments, high-end microscopic equipment and transfer equipment.

Contact Us

Company Address:

Huai'an (Headquarters): No. 7, Meigao Road, Qingpu Industrial Park, Qingjiangpu District, Huai'an City, Jiangsu Province

Suzhou: 4th Floor, Building D, China-Netherlands Innovation Harbor, No. 588 Xiangrong Road, Beihejing Sub-district, Xiangcheng District, Suzhou City, Jiangsu Province

Email:service@abner-nano.com

Contact Number: 13327968688  Mr. Yan

              

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