ALD原子层沉积系统是一款独立可控制的薄膜生长设备,能够实现全自动工艺控制并包含完整的安全联锁功能。ALD应用领域 广泛,如高K栅氧化层、存储容性电介质、铜互连中高深宽比扩散阻挡层、OLED无针孔钝化层、MEMS高均匀镀膜、纳米多孔结构 镀膜、特种光纤掺杂、太阳能电池、平板显示器、光学薄膜以及其他各类特殊结构纳米薄膜等。
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Company Address:
Huai'an (Headquarters): No. 7, Meigao Road, Qingpu Industrial Park, Qingjiangpu District, Huai'an City, Jiangsu Province
Suzhou: 4th Floor, Building D, China-Netherlands Innovation Harbor, No. 588 Xiangrong Road, Beihejing Sub-district, Xiangcheng District, Suzhou City, Jiangsu Province
Email:service@abner-nano.com
Contact Number: 13327968688 Mr. Yan

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