ALD Atomic Layer Deposition Solutions

The ALD atomic layer deposition system is an independently controllable thin-film growth equipment, capable of fully automatic process control and equipped with complete safety interlock functions. ALD has a wide range of application fields, such as high-K gate oxide layers, storage capacitive dielectrics, high-aspect-ratio diffusion barrier layers in copper interconnections, pinhole-free passivation layers for OLEDs, highly uniform coating for MEMS, coating of nanoporous structures, doping of special optical fibers, solar cells, flat panel displays, optical thin films, and various other nano-thin films with special structures.

Main Parameters