The E2 Series Multi-Functional 2D Material Transfer System is a mature commercial solution for transferring low-dimensional material heterojunction devices. It has been deployed in the laboratories of numerous renowned scholars at home and abroad, including academicians, Yangtze River Distinguished Professors, National Distinguished Young Scholars, and National Young Thousand Talents Program awardees. Multiple high-impact research papers have been published based on this system in journals such as ACS Nano, Nano Energy, and Advanced Materials (AM). It supports precise site-specific transfer of monolayer materials including graphene, molybdenum sulfide, and black phosphorus, as well as the fabrication of multilayer van der Waals heterojunctions, enabling visualizable operations during low-dimensional material transfer.
While retaining the outstanding integrated transfer capabilities of the original E2 model, the E2 series features an upgraded metallurgical microscope optical system that drastically boosts the resolution and clarity for observing monolayers, multilayers, and various van der Waals heterojunctions.
Main Configuration
Substrate carrying platform | 5-axis adjustable, with two translational axes along the X and Y directions and a travel range of 20 mm; the Z-axis travel range is 10 mm; horizontal tilt angle adjustment of ±2°; manual rotation adjustment around the Z-axis ranging from -90° to +90°; the sample stage supports heating up to a maximum temperature of 240℃ with a temperature control stability of 0.1℃, and is equipped with a vacuum sample adsorption function |
Slide Moving Platform | Five-axis adjustable design with three-axis manual translation along XYZ directions and a travel range of 25 mm; samples are loaded onto a manual rotary stage with a table diameter of 100 mm. The coarse rotation range is 360°, the fine rotation range is ±5°, and the positioning accuracy is 1 to 2°. The slide tilt angle along the Y-axis is adjustable within a range of ±15°. |
microscope | Domestic metallurgical microscope body with trinocular head, equipped with two 10× eyepieces and three objective lenses of 5×, 20× and 50× |
Microscopic camera | 12 million-pixel high-sensitivity CMOS sensor; equipped with operating software for microscopic cameras |
High-stability microscopic observation stand | The microscope can independently travel 50 mm along the X and Y axes, enabling wide-range adjustment of the microscope's observation position after two-dimensional material lamination; the focusing travel range is 30 mm with a precision of 1 μm. |
Control chassis | Integrated electrical control of the system, controlling the heating and adsorption of the sample stage as well as the brightness adjustment of microscopic illumination |
Control host | Intel Core i5 processor, 8GB RAM, 1TB hard drive, 23.8-inch high-definition monitor |
Optional Functions | Magnetic adsorption probe station and support, electric precision displacement module and controller, fiber end-face material transfer module, installation for glove box operating environment, matching damped optical vibration isolation platform |
Standard Configuration
Cost-effective domestic metallographic microscope upgrade solution: 95mm extra-long working distance objectives with magnifications of 5×, 20× and 50×; brightfield epi-illuminator equipped with field stop and aperture stop adjustment functions, 6500K white LED lighting; trinocular tube with 10× eyepieces, featuring switching function for imaging and observation, 20mm field of view.
Microscopic Imaging Optical Path System: Composed of a coaxial illumination system, 95 mm ultra-long working distance objectives with magnifications of 5×, 20× and 50×, a 12-megapixel CMOS microscopic camera, and a 23.8-inch full HD professional monitor. The high-sensitivity 12-megapixel CMOS microscopic camera features an exposure time ranging from 0.1 ms to 15 s and automatic white balance. Matching microscopic camera operation software is provided, which supports functions including photo capturing, video recording, sample dimension measurement, split-screen comparison and computer control. The microscopic imaging optical path system enables clear visualization of mechanically exfoliated single-layer graphene samples on silicon wafers.
Substrate loading platform: XYR three-axis adjustable; travel range in X and Y directions
20mm，System resolution: 0.002 mm; manual rotation adjustment of ±90° around the Z-axis, fine adjustment travel of 5° via micrometer with an adjustment accuracy of approximately 0.1°; tilt stages for X-axis and Y-axis with manual handwheel adjustment, stage thickness of 20 mm, and tilt angle of ±2°. It is used to adjust the parallelism of samples on substrates and glass slides during transfer; Z-axis travel of 10 mm with an accuracy of 2 μm; maximum heating temperature of the sample stage is 240 ℃; the sample stage is equipped with a vacuum adsorption function for samples to ensure precise fixation of target samples during transfer. The flow rate of the vacuum pump is 35 L/min.
Slide Stage: Three-axis XYZ adjustable design with an 80 mm high-stability platform. The travel range of the X and Y axes is 25 mm, controlled by micrometer screws. The Z axis adopts a 29 mm diameter graduated micrometer head to facilitate precise lifting and lowering without obvious sample vibration during movement. Samples are placed on a manual rotary stage with a 100 mm diameter platform. It features a 360° coarse rotation range and a ±5° fine rotation range with a positioning accuracy of 1 to 2°. The slide tilt angle along the Y axis is adjustable within a range of ±15° at an adjustment precision of approximately 0.1°, operated via a manual micrometer head.
Optional Functions
Option 1: Magnetic Adsorption Probe Station and Bracket
Optional Configuration 2: Motorized Precision Displacement Module & Controller
The motorized Z-axis is equipped with imported motors and controllers, offering a travel range of 25 mm and a minimum positioning precision of 0.1 μm. It supports multiple adjustable speed levels, alongside continuous and step-by-step motion modes, making it suitable for slow heterojunction lamination, automated lamination inside glove boxes, and other applications. Precise regulation of Z-axis moving speed minimizes interlayer bubbles generated during heterojunction transfer lamination, and enables ultra-fine Z-axis manipulation within glove box environments.
The motorized rotation stage adopts imported motors and controllers, with a rotation range of ±90° and angular precision up to 0.01°. It features both continuous rotation and single-step rotation functions. It is particularly ideal for fabricating stacked double-layer twisted graphene, as well as various twisted and misaligned heterojunction 2D devices that demand precise control over stacking orientation.
The METATEST motor control software facilitates straightforward speed configuration and motion management for motorized stages. It also supports image rotation and transparency adjustment, greatly simplifying sample localization and high-precision transfer operations. For transferring certain special materials with strict environmental requirements such as perovskites, the transfer system can be customized and installed for operation inside glove boxes.
Optional Configuration 3: Matching Damped Optical Vibration Isolation Platform
Matching damped optical vibration isolation platform to suppress environmental disturbances during high-magnification operations. Multiple tabletop dimensions are available, including 90060050 mm and 60060050 mm.
