1. Product Overview
The ABN PL series by Aibona is a desktop 3D lithography system designed for micro-nano fabrication. Adopting lithography-grade motion control and optical imaging technologies, it achieves forming with an optical precision of 1–10 μm. It can directly write complex 3D micro-nano structures, high-aspect-ratio structures and composite material microstructures without photomasks or molds. The three models feature benchmark optical precision of 2 μm, 5 μm and 10 μm respectively, catering to diverse requirements ranging from fine prototyping to medium-batch microstructure manufacturing. It boasts advantages including high forming precision, short manufacturing cycle, broad material compatibility and controllable costs.
II. Equipment Specifications
| parameter | PL-02 | PL-05 | PL-10 |
|---|
| Reference optical accuracy | 2μm | 5μm | 10μm |
| Forming accuracy range | 1–2μm | 1–5μm | 1–10μm |
| Layer thickness | 1–20μm | 1–20μm | 1–20μm |
| Maximum forming size | 50×50×25 mm³ | 50×50×25 mm³ | 50×50×25 mm³ |
| light source | LED 405nm | LED 405nm | LED 405nm |
| Motion platform positioning accuracy | nanoscale | nanoscale | nanoscale |
| Minimum volume of the material tank | 15ml | 15ml | 15ml |
| Printable materials | Photosensitive resin, biocompatible materials, ceramic slurry, hydrogel, etc. | photosensitive resin, biocompatible materials, ceramic slurry, hydrogel, etc. | photosensitive resin, biocompatible materials, ceramic slurry, hydrogel, etc. |
| Operating System | Windows，Compatible with standard 3D design files（STL/CLI） | Windows，Compatible with standard 3D design files（STL/CLI） | Windows，Compatible with standard 3D design files（STL/CLI） |
| Overall dimensions | Benchtop compact type (approx. 600×500×800 mm, subject to manufacturer's specification) | Benchtop compact type (approx. 600×500×800 mm, subject to the manufacturer's specification) | Benchtop compact type (approx. 600×500×800 mm, subject to manufacturer specifications) |
III. Functional Features
High-precision 3D stitching fabrication: Supports seamless stitching across fields of view, enabling scalable build dimensions while maintaining overall accuracy.
Full-frame map navigation and autofocus: Full-area scanning and focusing to guarantee uniform accuracy across large surfaces.
Real-time optical monitoring: Real-time imaging during exposure, with in-line inspection of interlayer alignment and structural quality.
Nanoscale motion stage: Closed-loop control for XYθ and Z axes, achieving nanometer-level positioning accuracy to ensure uniform layer thickness and feature precision.
Multi-material compatibility and butt-joint printing: Compatible with photosensitive resins, biomaterials, ceramic slurries, etc., supporting aligned overprinting / butt-joint printing on existing structures.
Automatic defoaming and vat management: Minimum vat volume of 15 ml; automatic defoaming reduces the impact of bubbles on fabrication.
Adaptive slicing and exposure strategy: Adjustable layer thickness ranging from 1–20 μm; multi-wavelength exposure available (optional for Premium/DLS models).
IV. Application Scenarios and Fields
Precision healthcare: Microneedle arrays, biological scaffolds, implant prototypes, drug delivery microstructures
Microfluidic chips: Microchannels, mixers, droplet generators, organ-on-a-chip molds
Micromechanics and MEMS: Microgears, microsensors, microactuators, precision connector prototypes
Mechanical metamaterials: Lattice structures, negative Poisson's ratio structures, phononic crystals, mechanical metasurfaces
Consumer electronics: Micro-optical components, precision molds, micro connectors, sensor parts
Materials science: Composite microstructures, ceramic green bodies, functionally graded material prototypes
V. Technical Advantages
Leading Precision: Optical precision down to 1μm, with high consistency of feature size and low sidewall roughness.
Maskless Direct Writing: No mask/mold required, enabling fast design iteration and remarkable cost advantages for small-batch production.
High Aspect Ratio Capability: Capable of fabricating microstructures with an aspect ratio greater than 20:1, suitable for applications such as microchannels and micropillar arrays.
Stitching and Alignment Printing: Full-field navigation plus alignment printing, supporting large-area stitching and heterogeneous structure integration.
Wide Material Compatibility: Compatible with photosensitive resins, biomaterials (e.g., GelMA), and ceramic slurries, meeting medical and industrial requirements.
Cost and Cycle Optimization: Desktop design, low consumable consumption and short manufacturing cycle, ideal for research and development to pilot production stages.
Product Imaging
