I. Product Introduction
The ABNAR UM Pro+ Maskless UV Lithography System is a high-performance direct-write lithography tool developed to meet the research demands of universities, research institutes and advanced micro-nano device development. Adopting DMD (Digital Micromirror Device) dynamic mask imaging technology, the system eliminates the need for conventional physical photomasks, enabling rapid pattern generation, modification and exposure. It greatly reduces process costs and improves research efficiency. Featuring a modular optical and motion control architecture, the UM Pro+ delivers high-resolution imaging, stable exposure and flexible processing capabilities. It is suitable for a wide range of applications including 2D material devices, MEMS, micro-nano sensors, optoelectronic devices and teaching experiments. Supporting multiple exposure modes and pattern data interfaces, the system can be seamlessly integrated into existing cleanrooms or open laboratory environments. It represents a truly domestic maskless lithography solution designed for "research-friendliness and engineering scalability".
II. Product Features
Maskless Direct Writing: Digital lithography based on DMD, eliminating the mask fabrication process, and integrating design, exposure and iteration.
Highly Flexible Pattern Control: Supports real-time pattern modification, grayscale exposure and multi-area exposure.
High-Stability Optical System: Collimated uniform illumination design to ensure exposure consistency.
Modular Expansion: Compatible with multi-wavelength light sources, alignment modules and automated platform expansion.
Compatible for Research and Teaching: User-friendly operation with multi-level permission management, suitable for teaching experiments and scientific research simultaneously.
III. Technical Specifications (Typical Configuration)
1. Lithography Method
Lithography Type: Maskless Lithography; Imaging Method: DMD Digital Micromirror Array Projection Imaging; Exposure Mode: Direct-write Exposure / Area Exposure / Grayscale Exposure
2. Optical System
Light Source Type: High-stability UV LED / UV Laser (Optional); Optional Wavelengths: 365 nm (i-line), 385 nm / 405 nm (Customizable); Optical Structure: Collimated Illumination + Projection Scaling Imaging System; Illumination Uniformity: ≥ 85%
3. Resolution and Exposure Performance
Minimum Line Width: ≤ 1.0 μm (Dependent on light source and objective lens configuration); Pattern Accuracy: ≤ ±0.3 μm; Exposure Time: Adjustable from millisecond to second level; Grayscale Levels: ≥ 256 levels
4. DMD Module
DMD Resolution: 1920 × 1080 (Higher specifications optional); Micromirror Size: 7.6 μm (Typical value); Pattern Refresh Rate: ≥ 60 Hz
5. Sample and Stage
Supported Substrate Size: Standard: ≤ 4-inch wafer; Optional: 6-inch / Irregular samples; Sample Stage Travel Range: X / Y: ≥ 100 mm × 100 mm, Z: ≥ 10 mm; Positioning Accuracy: ≤ 1 μm; Repeat Positioning Accuracy: ≤ ±0.5 μm
6. Alignment and Observation (Optional)
Alignment Method: Optical Microscopy Alignment / Mark Point Alignment; Alignment Accuracy: ≤ ±1 μm; Observation System: Industrial-grade CCD / CMOS Camera
7. Software and Data Interface
Control Software: Aibona UM Litho Control Suite; Supported File Formats: GDSII / DXF / BMP / PNG; Operating System: Windows; Supported Functions: Pattern Import and Editing, Batch Setting of Exposure Parameters, Multi-layer Process Flow Management
8. Environmental and Electrical Parameters
Operating Environment:
Temperature: 18–26 ℃
Humidity: ≤ 60% RH
Power Supply Requirement: AC 220 V ±10%, 50 Hz
Total Power Consumption: ≤ 1.5 kW
IV. Typical Application Fields
2D material devices (graphene, TMDs, hBN, etc.)
Micro-nano electronic and optoelectronic devices
MEMS / microsensors
Rapid prototyping of micro-nano structures
Micro-nano fabrication teaching experiments for universities
V. Summary of Product Positioning
The Aibona UM Pro+ maskless lithography system is positioned around the core of "cost-effective domestic alternative + research-grade performance". While retaining microscale processing capability, it greatly lowers the threshold and operating cost of lithography. It serves as an ideal option for university laboratories, research institutes and startup R&D teams to build micro-nano fabrication capabilities.
Product appearance drawing:
